4f Imaging System Method to Determine Optical properties of Thin Film Magnetic Material

Publons ID(not set)
Wos IDWOS:000598554800029
Doi10.1063/1.5141642
Title4f Imaging System Method to Determine Optical properties of Thin Film Magnetic Material
First Author
Last Author
AuthorsFranata, N; Sari, FP; Hakim, L; Sudarmaji, A; Handoyo; Handoko, D;
Publish Date2019
Journal NameINTERNATIONAL CONFERENCE ON SCIENCE AND APPLIED SCIENCE (ICSAS) 2019
Citation1
AbstractIn recent years, X-ray has been attracting enormous attention as a tool to determine the magnetic properties of thin film material. We have constructed a simple method base on 4F imaging system to determine analytically optical properties of thin film material. Very small narrow slit is applied to yield diffraction and interference pattern in the X-ray scale. It was found that the sequential changes of Fraunhofer diffraction pattern due to slit width variation. Sensitivity of the method was validated by measuring the power distribution of the temporal observed patterns. The object shape was also varied for comprehensive discussion.
Publish TypeBook in series
Publish Year2019
Page Begin(not set)
Page End(not set)
Issn0094-243X
Eissn
Urlhttps://www.webofscience.com/wos/woscc/full-record/WOS:000598554800029
AuthorARIEF SUDARMAJI
File24300.pdf